Harm joined NLO in 2009. He is a physicist, specialising in plasma physics. He has also been actively involved in light sources research. After his promotion, Harm worked as researcher at Philips Research in the area of video processing algorithms and systems. In 2006 he became an architect at NXP Semi-conductors, gaining experience with various subjects such as embedded software and signal processing architectures. He is also experienced in innovation policy and patent portfolio strategy.
Harm specialises in electrical engineering and physics.
Harm obtained his PhD in Plasma Physics from the Eindhoven University of Technology (Netherlands, 2003). He has a MSc (with honours) in Applied Physics from the same university.
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